4.4 Article Proceedings Paper

Sub-5 nm FIB direct patterning of nanodevices

期刊

MICROELECTRONIC ENGINEERING
卷 84, 期 5-8, 页码 779-783

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ELSEVIER SCIENCE BV
DOI: 10.1016/j.mee.2007.01.059

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focused ion beam; selective epitaxy; quantum dots

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Nanoengraving of membranes as a template for nanopores fabrication is an application field of growing interest. Similarly to the formation of ion tracks in membranes created when high-energetic ions pass trough thin foils, it is possible with a FIB system to fabricate, design and organise nanodevices within thin membranes. In this work, we detail the advanced methodology we have carefully optimised for such deep sub-10 nm nanodevices fabrication using our high-performance FIB instrument. (c) 2007 Elsevier B.V. All rights reserved.

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