Selective growth and MOCVD loading of small single crystals of MOF-5 at alumina and silica surfaces modified with organic self-assembled monolayers

y Thin polycrystalline films of phase-pure MOF-5 were grown directly from supersaturated MOF-5 mother solutions on suitably pretreated alumina and silica substrates. The surface acid/base properties characterized by the isoelectric point of the bare substrates controls the anchoring of MOF-5 nuclei. In addition to COOH-terminated SAMs on SiO2, ALD-Al2O3 proved to be a very good adhesive for selective MOF-5 growth. The adsorption properties of the deposited MOF films on Al2O3 substrates were demonstrated by MOCVD loading with [(eta(5)-C5H5)Pd(eta(3)-C3H5)] as Pd precursor to finally yield the palladium-loaded thin film material {Pd@MOF-5}/Al2O3 as a model of a variety of conceivable MOF-based functional chemical systems at surfaces.