期刊
MICROELECTRONIC ENGINEERING
卷 84, 期 5-8, 页码 925-927出版社
ELSEVIER SCIENCE BV
DOI: 10.1016/j.mee.2007.01.081
关键词
nanoimprint lithography; alignment; Moire
Nanoimprint lithography (NIL) is a cost efficient technique for the mass production of nanostructures. We demonstrate alignment accuracies in the range of 100 nm and below in UV-based nanoimprint lithography (UV-NIL) using a simple optical technique. The advantages of this technique are the relative simplicity of the marker-design and the whole setup combined with the possibility of an upgrade of existing equipment and still ultra-high precision alignment capabilities. (c) 2007 Elsevier B.V. All rights reserved.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据