期刊
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
卷 87, 期 3, 页码 351-357出版社
SPRINGER HEIDELBERG
DOI: 10.1007/s00339-007-3868-1
关键词
-
In this article we give an overview over the physical mechanisms involved in the electronic transport in ultrathin-body SOI Schottky-barrier MOSFETs. A strong impact of the SOI and gate oxide thickness on the transistor characteristics is found and explained using experimental as well as simulated data. We elaborate on the influence of scattering in the channel and show that for a significant barrier the on-state current is insensitive to scattering once the mean free path for scattering is larger than a characteristic length scale. In addition, recent efforts to lower the Schottky barrier at the source/drain channel interfaces are presented. Using dopant segregation during silicidation significantly lower effective Schottky barriers can be realized that allow for high performance SB-MOSFET devices.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据