期刊
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS
卷 46, 期 20-24, 页码 L568-L570出版社
INST PURE APPLIED PHYSICS
DOI: 10.1143/JJAP.46.L568
关键词
aberration correction; electron microscope; high resolution; dark field image
The performance of a newly developed high-resolution 300 kV microscope equipped with a spherical aberration corrector for probe-forming systems is reported. This microscope gave the highest resolution for the distance between atomic columns, as determined by a high-angle annular dark field imaging method using a GaN[211] crystalline specimen, where the distance between the neighboring columns of Ga was 63pm.
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