Effects of annealing and hydrogenation on the properties of ZnMnO polycrystalline films synthesized by plasma enhanced chemical vapour deposition

For the Mn-doped ZnO polycrystalline films fabricated with plasma enhanced chemical vapour deposition technique followed by thermal treatment at 600 degrees C for 5 h, the effects on both rapid thermal annealing up to 900 degrees C in Nitrogen ambient for 2 min and hydrogenation processing have been investigated. It has been indicated that after the rapid thermal annealing the magnetization of the films decreases. The magnetization of the films has been found to increase with the increase in hydrogenation processing duration at the early stage of the processing and gets a saturated value after about 60 min while there is a decrease with increasing electron concentration after a rapid thermal process in nitrogen ambient.