期刊
THIN SOLID FILMS
卷 515, 期 18, 页码 7117-7121出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.tsf.2007.03.012
关键词
titanium oxide; thin film; chemical vapor deposition; nitrogen dioxide; visible-light induced photocatalysis
Using TiCl4, 02, and N2O as precursors, N-doped titanium dioxide thin films with large area and continuous surface were obtained by atmospheric pressure chemical vapor deposition. Measurements of X-ray photoelectron spectroscopy, X-ray diffraction, scanning electron microscope, transmission electron microscope and ultravoilet-Visible transmission spectra were performed. Using N2O as N-doped source, anatase-rutile transformation is accelerated through oxygen vacancies formation, and the mean grain size of rutile crystallites decreases with the increase of NO flow rate. Compared to the pure TiO2, N-doped TiO2 films give a relative narrow optical band-gap, and their visible-liglit induced photocatalysis is much enhanced. Visible-light-induced hydrophilicity of the TiO2 thin films enhances with the increase of N2O flow rate, which might be due to the dentritic islands structure on the surface of the N-doped TiO2 thin films. (c) 2007 Elsevier B.V. All rights reserved.
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