期刊
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
卷 25, 期 4, 页码 1261-1264出版社
A V S AMER INST PHYSICS
DOI: 10.1116/1.2752513
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The authors developed a growth method for carbon nanotubes (CNTs) by using a resist-assisted patterning process. The CNTs can be grown directly on the patterned catalyst surface without a diffusion barrier. The growth-site patterns were fabricated on a nickel/silicon (Ni/Si) substrate by a conventional lithography method using a photopatternable resist. The growth mechanism of the CNTs without diffusion barrier was confirmed by Raman spectroscopy and transmission-electron microscope measurement. The carbon-network formation during forming the process is a key parameter for CNT growth. The technique will be applicable to a low-cost fabrication process of electron-emitter arrays. (c) 2007 American Vacuum Society.
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