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Heterogeneous InSb quantum well transistors on silicon for ultra-high speed, low power logic applications

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ELECTRONICS LETTERS
卷 43, 期 14, 页码 777-779

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INST ENGINEERING TECHNOLOGY-IET
DOI: 10.1049/el:20071335

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The heterogeneous integration of InSb quantum well transistors onto silicon substrates is investigated for the first time. 85 nm gate length FETs with f(r) = 305 GHz at V-ds = 0.5 V and DC performance suitable for digital logic are demonstrated on material with a buffer just 1.8 mu m thick. An initial step towards integrating InSb FETs with mainstream Si CMOS for high-speed, energy-efficient logic applications has been achieved.

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