期刊
CHEMISTRY OF MATERIALS
卷 19, 期 14, 页码 3381-3386出版社
AMER CHEMICAL SOC
DOI: 10.1021/cm0615931
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A new synthetic route for the deposition of CoAl2O4 thin films at low temperature via MOCVD using the single-source precursor {Co[Al((OC3H7)-C-i)(4)](2)} is presented. Molecular properties of {Co[Al((OC3H7)-C-i)(4)](2)} have been investigated by means of NMR spectroscopy, mass spectrometry, and thermal analysis. Deposits have been characterized by XRD, AFM, UV-vis, and SIMS measurements.
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