Two-photon fluorescent holographic rewritable micropatterning

Monomeric amorphous systems involving an upper azo-based layer and a lower fluorophore layer have been carefully designed to enable holographic formation of micrometric emissive photopatterns through reversible photoinduced mass migration of azoderivatives. The fluorescent patterns evidenced by NIR biphotonic excitation match the micrometric surface relief. After successful erasure by using a circularly polarized visible light, new patterns can be written again.