期刊
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS
卷 46, 期 8B, 页码 5626-5630出版社
JAPAN SOC APPLIED PHYSICS
DOI: 10.1143/JJAP.46.5626
关键词
Kelvin probe force microscopy; atomic force microscopy
A variation of Kelvin probe force microscopy that does not require bias-voltage feedback for contact potential difference (CPD) detection was proposed. Two independent lock-in amplifiers were used to measure the first- and second-order derivatives of the electrostatic force exerted on the cantilever, and CPD was deductively determined from these signals. The application of this technique to the unsaturated Au/Si(111)-5 x 2 system confirmed that the instability of the measurement system resulting from bias-voltage feedback can be completely eliminated and that CPD measurement at a finite bias voltage is possible.
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