期刊
MATERIALS TRANSACTIONS
卷 48, 期 8, 页码 2202-2206出版社
JAPAN INST METALS
DOI: 10.2320/matertrans.MRA2007059
关键词
silicon; nanowire; chemical vapor deposition processes; disilane; wiring
Silicon nanowires (SiNWs) on a {100} silicon wafer coated with a gold film were formed by thermal cracking of disilane at 473-573 K. The SiNWs were single-crystalline with 10-100 nm in diameter and a < 111 > crystal orientation. The optimum conditions for obtaining long SiNWs that are several hundred mu m long include a disilane flow rate of 0.017 cm(3)/s, an argon gas flow rate of 0.33 cm(3)/s, and a total pressure of 0.67 kPa. The low-temperature formation of SiNWs was explained by lowering the melting point of Au-Si eutectic particles. Self-wiring of SiNWs between gold square dots placed 15 mu m from each other was successfully conducted.
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