4.6 Article

Oriented growth of Fe3O4 thin film on crystalline and amorphous substrates by pulsed laser deposition

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JOURNAL OF PHYSICS D-APPLIED PHYSICS
卷 40, 期 16, 页码 4943-4947

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IOP PUBLISHING LTD
DOI: 10.1088/0022-3727/40/16/028

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We have deposited magnetite thin films using the pulsed laser deposition technique from a alpha-Fe2O3 target on different substrates ( Si ( 1 1 1), GaAs ( 1 0 0), Al2O3 ( 0 0 1) and amorphous float glass (FG)) without any buffer layer at a substrate temperature of 450 degrees C. These films have been characterized by x-ray diffraction (XRD), x-ray photoelectron spectroscopy (XPS), Raman spectroscopy, ac magnetic susceptibility and four-probe resistivity. The XRD results of these films show highly ( 1 1 1) oriented growth and single phase nature of Fe3O4 films on all substrates. Fe 2p core level x-ray photoelectron spectra and Raman spectra reveal the formation of Fe3O4 throughout the thickness of the films. All films show a Verwey transition at or around 120 K. It is observed that the oriented growth of Fe3O4 films takes place along the [ 1 1 1] direction on these substrates, which have either a huge lattice mismatch or no matching at all ( as in FG) with Fe3O4.

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