4.3 Article Proceedings Paper

Circuits using uniform TFTs based on amorphous In-Ga-Zn-O

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WILEY
DOI: 10.1889/1.2812992

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thin-film transistors (TFTs); amorphous-oxide semiconductors; uniformity; sputtering; ring oscillators; organic light-emitting diodes (OLEDs)

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High-performance and excellent-uniformity thin-film transistors (TFTs) having bottom-gate structures are fabricated using an amorphous indium-gallium-zinc-oxide (IGZO) film and an amorphous-silicon dioxide film as the channel layer and the gate insulator layer, respectively. All of the 94 TFTs fabricated with an area 1 cm(2) show almost identical transfer characteristics: the average saturation mobility is 14.6 cm(2)/(V-sec) with a small standard deviation of 0.11 cm(2)/(V-sec). A five-stage ring-oscillator composed of these TFTs operates at 410 kHz at an input voltage of 18 V. Pixel-driving circuits based on these TFTs are also fabricated with organic light-emitting diodes (OLED) which are monolithically integrated on the same substrate. It is demonstrated that light emission from the OLED cells can be switched and modulated by a 120-Hz ac signal input. Amorphous-IGZO-based TFTs are prominent candidates for building blocks of large-area OLED-display electronics.

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