期刊
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY
卷 129, 期 46, 页码 14232-14239出版社
AMER CHEMICAL SOC
DOI: 10.1021/ja073043p
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资金
- National Research Foundation of Korea [2006-07793, R11-2005-048-03001-0, 2005-02522, 2006-07789, R11-2005-048-02004-0, 과06A1507] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
We report a new fabrication method of asymmetric colloidal clusters by using contact area lithography with site-selective growth. Nanometric surface patterns (similar to 44, 60, and 81 nm in diameter) were prepared by coating surfaces with self-assembled monolayers (SAMs;octaclecyltrichlorosilane (OTS) in this study) except the contact area either between colloidal particles or between colloids and substrate. Nanoscale site-specific heterogeneous nucleation and growth of oxide materials of titanium were studied using the patterns of OTS-SAMs onto the either flat or curved surfaces of SiO2. Experimental results suggest that a combination of the large difference in the surface energy between the growing and surrounding surfaces and the diffusion-controlled growth leads to complete nanoscale site specificity. We also fabricated superstructrures of silica spheres with hemispheres of titania (< 20 nm in dimension) on their surfaces and discussed the optical properties of colloidal films consisting of the monodisperse asymmetric colloidal clusters in terms of photonic band gap.
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