期刊
出版社
ELSEVIER SCIENCE BV
DOI: 10.1016/j.nimb.2007.09.042
关键词
ion implantation; high-current ion implanter; positive ion beam; beam current measurement method
The development of a low-cost, accurate, non-intercepting continuous method for measuring the beam current in a high-current ion implanter is described. The method, named a differential current monitor, is based on the electric charge conservation principle, applied to the currents that flow in the implanter electrical system, due to the acceleration voltage applied to the ion beam and the leakage currents to around. This method allows for continuous measurement of the ion beam current without intercepting it. Since its installation, it is possible to accurate measure ion beam currents from tens of mu A to mA, which is the normal range for this type of system. (C) 2007 Elsevier B.V. All rights reserved.
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