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Stress-induced band gap tuning in ⟨112⟩ silicon nanowires

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APPLIED PHYSICS LETTERS
卷 91, 期 26, 页码 -

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AMER INST PHYSICS
DOI: 10.1063/1.2826267

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We show via density functional calculations that the electronic band structures of < 112 >-oriented hydrogenated silicon nanowires (SiNWs) could be significantly altered by axial stresses. In particular, an axial compression could cause an indirect-to-direct band gap transition in < 112 > SiNWs. As direct energy band may induce strong light-emission properties of Si, the possibility of indirect-to-direct band transition via axial stress has fundamental implications in exploiting SiNWs for optoelectronic applications. (c) 2007 American Institute of Physics.

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