4.6 Article

Engineering of two-photon spatial quantum correlations behind a double slit

期刊

PHYSICAL REVIEW A
卷 79, 期 4, 页码 -

出版社

AMER PHYSICAL SOC
DOI: 10.1103/PhysRevA.79.043817

关键词

optical correlation; optical images; optical phase matching; phase measurement; quantum entanglement; quantum optics; two-photon processes

资金

  1. Stichting voor Fundamenteel Onderzoek der Materie

向作者/读者索取更多资源

This paper demonstrates the engineering of spatially entangled two-photon states behind a double slit by tailoring the incident pure two-photon state. We experimentally characterize many different two-photon states by measuring their complete two-photon interference patterns in the far field of the double slit. Spatial entanglement right behind the double slit can reside in either the modulus or the phase of the two-photon field. The balance between these two types of entanglement is fully controlled by experimentally utilizing the phase-front curvatures of the pump beam and the phase-matching profile. We project either a far-field image or a magnified near-field image of the two-photon source onto the double slit. Our theoretical analysis shows how the two-photon interference pattern behind the double slit effectively acts as a phase-sensitive probe of the incident two-photon field profile. We thus present phase-sensitive measurements of the generated two-photon field profile probed in an image plane of the two-photon source.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.6
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据