期刊
ADVANCED MATERIALS
卷 26, 期 29, 页码 5012-5017出版社
WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.201401290
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资金
- DFG-ANR bilateral funding program [ANR- 09-BLAN-0426-01, DFG CA880/3-1]
- Agence Nationale de la Recherche (ANR) [ANR-09-BLAN-0426] Funding Source: Agence Nationale de la Recherche (ANR)
Polyurethane thin films that photopolymerize and photodegrade upon exposure to light of different wavelengths are presented. The chromic response is based on two caged monomers with the ability to be activated or photocleaved with different wavelengths under single and two-photon excitation. This material represents a dual photoresist with positive and negative tone contained in a single resist formulation and with the ability to generate complex 2D and 3D patterns.
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