Fabrication of Ordered, Large Scale, Horizontally-Aligned Si Nanowire Arrays Based on an In Situ Hard Mask Block Copolymer Approach

ADVANCED MATERIALS

卷 26, 期 8, 页码 1207-1216

WILEY-V C H VERLAG GMBH

block copolymers; nanowires; patterning; silicon; photoelectron spectroscopy

Chemistry, Multidisciplinary Chemistry, Physical Nanoscience & Nanotechnology Materials Science, Multidisciplinary Physics, Applied Physics, Condensed Matter

1. Science Foundation Ireland through Semiconductor Research Corporation [2011-IN-2194, 09/SIRG/I1621]
2. CSET CRANN grant