Non-Porous Low-k Dielectric Films Based on a New Structural Amorphous Fluoropolymer

ADVANCED MATERIALS

卷 25, 期 35, 页码 4875-4878

WILEY-V C H VERLAG GMBH

dielectric constant; low k materials; insulators; fluoropolymers; thin solid films

Chemistry, Multidisciplinary Chemistry, Physical Nanoscience & Nanotechnology Materials Science, Multidisciplinary Physics, Applied Physics, Condensed Matter

1. Ministry of Science and Technology of China [2011ZX02703]