4.8 Article

Single-Step Formation of Graphene on Dielectric Surfaces

期刊

ADVANCED MATERIALS
卷 25, 期 4, 页码 630-634

出版社

WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.201202840

关键词

graphene; tansfer-free growth; Ni evaporation; rapid thermal annealing; Ni3C

资金

  1. National Science Foundation [CMMI 0758199, CMMI 0900419]
  2. Office of Naval Research [N00014-09-7581-0943]
  3. National Natural Science Foundation of China [90923039]
  4. Directorate For Engineering
  5. Div Of Civil, Mechanical, & Manufact Inn [0900419] Funding Source: National Science Foundation
  6. EPSCoR [1004094] Funding Source: National Science Foundation
  7. Office Of The Director [1004094] Funding Source: National Science Foundation

向作者/读者索取更多资源

The direct formation of graphene on various dielectric surfaces is successful via a single-step rapid thermal processing (RTP) of substrates coated with amorphous carbon (C) and nickel (Ni) thin films. High-quality graphene is obtained uniformly on the whole surface of wafers with a controlled number of graphene layers. The monolayer graphene exhibits a low sheet resistance and a high optical transmittance in the visible range.

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