期刊
ADVANCED MATERIALS
卷 24, 期 48, 页码 6445-6450出版社
WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.201201975
关键词
chemical vapor deposition; thin films; patterning; curved substrates; multifunctional surfaces
类别
资金
- MIT Institute for Soldier Nanotechnologies (ISN) [DAAD-19-02D-0002]
- U.S. Army Research Office
- National Science Foundation
A simple, efficient, and scalable method for patterning microstructures on curved substrates is demonstrated. Initiated chemical vapor deposition is used to synthesize a thin film that crosslinks upon UV exposure. Polymeric features are defined on glass rods with high curvature and used as masks for metal patterning. Additionally, vapor-deposited polymer layers are selectively patterned to produce bifunctional surfaces.
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