4.8 Article

Rectangular Symmetry Morphologies in a Topographically Templated Block Copolymer

期刊

ADVANCED MATERIALS
卷 24, 期 31, 页码 4249-+

出版社

WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.201104895

关键词

block copolymers; hybrid patterns; templated self-assembly; graphoepitaxy; square patterns

资金

  1. Semiconductor Research Corporation
  2. FENA Center
  3. NRI
  4. SMA
  5. National Science Foundation
  6. Taiwan Semiconductor Manufacturing Company
  7. Tokyo Electron
  8. NGS Singapore

向作者/读者索取更多资源

Using an array of majority-block-functionalized posts makes it possible to locally control the self-assembly of a block copolymer and achieve several morphologies on a single substrate. A template consisting of a square symmetry array of posts produces a square-symmetry lattice of microdomains, which doubles the areal density of features.

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