4.2 Article

Analysis and modeling of the high vacuum scanning spreading resistance microscopy nanocontact on silicon

期刊

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
卷 28, 期 2, 页码 401-406

出版社

A V S AMER INST PHYSICS
DOI: 10.1116/1.3273895

关键词

elemental semiconductors; indentation; molecular dynamics method; nanocontacts; nanoelectromechanical devices; plastic deformation; Raman spectra; semiconductor doping; silicon

资金

  1. Australian Research Council

向作者/读者索取更多资源

Within this paper, the authors propose a refined high vacuum scanning spreading resistance microscopy (HV-SSRM) electromechanical nanocontact model based on experimental results as well as molecular dynamics (MD) simulation results. The formation under the tip of a nanometer-sized pocket of beta-tin, a metastable metalliclike phase of silicon (also named Si-II), acting as a virtual probe is demonstrated. This gives a reasonable explanation for the superior SSRM spatial resolution as well as for the electrical properties at the Schottky-like SSRM contact. Moreover, the impact of the doping concentration on the plastic deformation of silicon for different species using micro-Raman combined with indentation experiments is studied. In order to elucidate the superior results of SSRM measurements when performed under high vacuum conditions, the impact of humidity on the mechanical deformation and Si-II formation is also analyzed using MD and SSRM experimental results.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.2
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据