4.8 Article

High-Pressure Chemical Deposition for Void-Free Filling of Extreme Aspect Ratio Templates

期刊

ADVANCED MATERIALS
卷 22, 期 41, 页码 4605-4611

出版社

WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.201001199

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资金

  1. NSF [DMR-0806860]
  2. Penn State Materials Research Science and Engineering Center [NSF DMR-0820404]
  3. EPSRC [EP/G028273/1]
  4. NSF/EPSRC Materials World Network
  5. Royal Academy
  6. Engineering and Physical Sciences Research Council [EP/G028273/1, EP/G051755/1] Funding Source: researchfish
  7. EPSRC [EP/G028273/1, EP/G051755/1] Funding Source: UKRI

向作者/读者索取更多资源

Near atomically smooth, void-free, centimeter-long amorphous silicon waveguides are produced by high pressure chemical fluid deposition in the pores of a microstructured optical fiber template (right inset). Semiconductor waveguides fabricated by conventional deposition/fabrication approaches have a surface roughness that is a constraining factor in most optoelectronic devices, but these waveguides conform to the extraordinarily geometrically perfect optical fiber pores (DIC image, bottom inset).

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