期刊
ADVANCED MATERIALS
卷 21, 期 20, 页码 2072-2076出版社
WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.200803648
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资金
- DARPA [W31P4Q-08-1-0009]
- BES DOE [DE-FG02-07ER46394]
- Air Force Office [FA9550-08-1-0446]
- KAUST Global Research Partnership
A novel technique for fabrication of patterned and aligned polymer-nanowire/micro- and nanotube (PNW/PNT) arrays on a wafer-level substrate of any material is reported. By creating a designed pattern on a spin-coated polymer film using techniques, such as stamping or micro-tip writing, plasma etching results in the formation of aligned PNW arrays distributed according to the pattern.
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