4.8 Article

Wafer-Level Patterned and Aligned Polymer Nanowire/Micro- and Nanotube Arrays on any Substrate

期刊

ADVANCED MATERIALS
卷 21, 期 20, 页码 2072-2076

出版社

WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.200803648

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资金

  1. DARPA [W31P4Q-08-1-0009]
  2. BES DOE [DE-FG02-07ER46394]
  3. Air Force Office [FA9550-08-1-0446]
  4. KAUST Global Research Partnership

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A novel technique for fabrication of patterned and aligned polymer-nanowire/micro- and nanotube (PNW/PNT) arrays on a wafer-level substrate of any material is reported. By creating a designed pattern on a spin-coated polymer film using techniques, such as stamping or micro-tip writing, plasma etching results in the formation of aligned PNW arrays distributed according to the pattern.

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