期刊
ADVANCED MATERIALS
卷 21, 期 19, 页码 1921-1926出版社
WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.200802434
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资金
- Direct For Mathematical & Physical Scien
- Division Of Materials Research [804449] Funding Source: National Science Foundation
By employing a block copolymer to spatially organize silver nanoparticles, laser light can be concentrated via plasmon resonance to locally expose a photoresist. By subsequent development, this plasmonic lithography can provide deep subwavelength scale features.
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