Solvent-Vapor-Induced Tunability of Self-Assembled Block Copolymer Patterns

Self-assembly of a block copolymer into cylindrical and/or perforated lamellar arrays within substrate trenches can be extensively tuned during the solvent-annealing process. Following reactive-ion etching SEM images reveal that the, solvent mixing ratio and the vapor pressure determine the type of array obtained and influence the dimensions of the repeat unit.