4.8 Article

Fabrication of Three-Dimensional Photonic Crystals Using Multibeam Interference Lithography and Electrodeposition

期刊

ADVANCED MATERIALS
卷 21, 期 29, 页码 3012-+

出版社

WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.200802085

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资金

  1. Army Research Office [DAAD 19-03-1-0227]
  2. U.S. Department of Energy [DEFG02-91-ER45439]
  3. Japan Society for the Promotion of Science (JSPS)

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High-quality 3D photonic crystals are fabricated through electrode position into a polymer template created by multibeam interference lithography. Complete infilling of the template is achieved through electrodeposition of Cu2O, and subsequent etching of the template results in a Cu2O/air photonic crystal with the exact inverse structure of the template (see figure). The resultant photonic crystal shows a high peak reflectance at the theoretically predicted wavelength.

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