期刊
ADVANCED MATERIALS
卷 20, 期 10, 页码 1898-+出版社
WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.200702930
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A universal block copolymer lithography is developed for a broad spectrum of materials including metals, semiconductors, ceramics, and polymers by combining advanced film deposition techniques with block copolymer lithography. The figure presents a nanopatterned platinum film prepared by applying universal block copolymer lithography.
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