期刊
ADVANCED MATERIALS
卷 20, 期 23, 页码 4563-4567出版社
WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.200800746
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- Junta de Comunicades Castilla la Mancha
- European Commission [NMP4-CT-2005-014006]
The photochemical structuring of a polysiloxane monolayer protected with a photocleavable group is shown by femtosecond laser pulses in the near-infrared. These experiments suggest a two-photon induced deprotection process that holds great promise for near-field monolayer photolithography far below the diffraction limit.
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