期刊
ADVANCED MATERIALS
卷 20, 期 3, 页码 596-+出版社
WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.200701725
关键词
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We describe a simple and experimentally convenient method to print and position metallic nanostructures on silicon wafer using nanotransfer edge printing (nTEP), which is a combination of thin-film metal deposition, nanotransfer printing (nTP), and edge lithography. The shape, width, and aspect ratio of the metal nanostructures can be precisely tuned during the fabrication process.
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