Highly Versatile and Robust Materials for Soft Imprint Lithography Based on Thiol-ene Click Chemistry

As easy as shake and bake, the mixing and photocuring of poly-functional thiols with alkene-functional cross-linkers, via thiol-ene click chemistry, leads to materials with outstanding and tunable characteristics for soft imprint lithography. The materials are cured within 2 minutes at ambient conditions allowing stamps with high aspect ratio and sub-100nm features to be fabricated.