Stop-Flow Lithography of Colloidal, Glass, and Silicon Microcomponents

Stop-flow lithography (SFL) is used for patterning colloidal building blocks into controlled structures (gears and other shapes) at rates that exceed 10(3) min(-1) using an index-matched system composed of silica microspheres suspended in a photocurable acrylamide solution as shown in the figure. These structures are dried and then transformed, in batch, at elevated temperatures into microcomponents composed of porous or glassy silicon oxide or porous silicon via magnesiothermic reduction.