期刊
ADVANCED FUNCTIONAL MATERIALS
卷 21, 期 4, 页码 658-666出版社
WILEY-V C H VERLAG GMBH
DOI: 10.1002/adfm.201001572
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资金
- Ministry of Education, Science and Technology [R31-10013]
- FCT [PTDC/CTM/098361/2008, PTDC/CTM/100468/2008, REDE/1509/RME/2005, SFRH/BPD/42506/2007]
- Fundação para a Ciência e a Tecnologia [PTDC/CTM/100468/2008] Funding Source: FCT
A new atomic layer deposition (ALD) process for nanocrystalline tin dioxide films is developed and applied for the coating of nanostructured materials. This approach, which is adapted from non-hydrolytic sol-gel chemistry, permits the deposition of SnO2 at temperatures as low as 75 degrees C. It allows the coating of the inner and outer surface of multiwalled carbon nanotubes with a highly conformal film of controllable thickness. The ALD-coated tubes are investigated as active components in gas-sensor devices. Due to the formation of a p-n heterojunction between the highly conductive support and the SnO2 thin film an enhancement of the gas sensing response is observed.
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