4.8 Article

Wafer Scale Formation of Monocrystalline Silicon-Based Mie Resonators via Silicon-on-Insulator Dewetting

期刊

ACS NANO
卷 8, 期 11, 页码 11181-11190

出版社

AMER CHEMICAL SOC
DOI: 10.1021/nn505632b

关键词

Mie resonators; thin fim dewetting; all-dielectric nanophotonics; silicon nanoparticles

资金

  1. A*MIDEX project - Investissements d'Avenir French Government program [ANR-11-IDEX-0001-02]
  2. French Institute Carnot Star
  3. LABEX WIFI (Laboratory of Excellence within the French Program Investments for the Future) [ANR-10-LABX-24, ANR-10-IDEX-0001-02 PSI*]

向作者/读者索取更多资源

Subwavelength-sized dielectric Mie resonators have recently emerged as a promising photonic platform, as they combine the advantages of dielectric microstructures and metallic nanoparticles supporting surface plasmon polaritons. Here, we report the capabilities of a dewetting-based process, independent of the sample size, to fabricate Si-based resonators over large scales starting from commercial silicon-on-insulator (SOI) substrates. Spontaneous dewetting is shown to allow the production of monocrystalline Mie-resonators that feature two resonant modes in the visible spectrum, as observed in confocal scattering spectroscopy. Homogeneous scattering responses and improved spatial ordering of the Si-based resonators are observed when dewetting is assisted by electron beam lithography. Finally, exploiting different thermal agglomeration regimes, we highlight the versatility of this technique, which, when assisted by focused ion beam nanopatterning, produces monocrystalline nanocrystals with ad hoc size, position, and organization in complex multimers.

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