4.8 Article

Van der Waals Epitaxy and Photoresponse of Hexagonal Tellurium Nanoplates on Flexible Mica Sheets

期刊

ACS NANO
卷 8, 期 7, 页码 7497-7505

出版社

AMER CHEMICAL SOC
DOI: 10.1021/nn5028104

关键词

van der Waals epitaxy; 2D tellurium nanoplate; mica substrate; flexible device; photodetector

资金

  1. 973 Program of the Ministry of Science and Technology of China [2012CB934103]
  2. 100-Talents Program of the Chinese Academy of Sciences [Y1172911ZX]
  3. National Natural Science Foundation of China [21373065]
  4. Beijing Natural Science Foundation [2144059]

向作者/读者索取更多资源

Van der Waals epitaxy (vdWE) is of great interest due to its extensive applications in the synthesis of ultrathin two-dimensional (2D) layered materials. However, vdWE of nonlayered functional materials is still not very well documented. Here, although tellurium has a strong tendency to grow Into one-dimensional nanoarchitecture due to its chain-like structure, we successfully realize 20 hexagonal tellurium nanoplates on flexible mica sheets via vdWE. Chemically inert mica surface is found to be crucial for the lateral growth of hexagonal tellurium nanoplates since it (1) facilitates the migration of tellurium adatoms along mica surface and (2) allows a large lattice mismatch. Furthermore, 2D tellurium hexagonal nanoplates-based photodetectors are in situ fabricated on flexible mica sheets. Efficient photoresponse Is obtained even after bending the device for 100 times, indicating 20 tellurium hexagonal nanoplates-based photodetectors on mica sheets have a great application potential in flexible and wearable optoelectronic devices. We believe the fundamental understanding of vdWE effect on the growth of 20 tellurium hexagonal nanoplate can pave the way toward leveraging vdWE as a useful channel to realize the 20 geometry of other nonlayered materials.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.8
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据