4.8 Article

On the Self-Assembly of Brush Block Copolymers in Thin Films

期刊

ACS NANO
卷 7, 期 11, 页码 9684-9692

出版社

AMER CHEMICAL SOC
DOI: 10.1021/nn402639g

关键词

brush polymers; solvent-annealing; self-assembly; periodic nanopatterns; large feature sizes

资金

  1. U.S. Department of Energy (DOE), Office of Basic Energy Sciences [DEFG02-96ER45612]
  2. Dow-Resnick Bridge award
  3. NSF [CHE-1048404]
  4. Samsung Display
  5. Office of Science, Office of Basic Energy Sciences, Material Science Division of the U.S. Department of Energy at Lawrence Berkeley National Laboratory [DE-AC02-05CH11231]

向作者/读者索取更多资源

We describe a simple route to fabricate two dimensionally well-ordered, periodic nanopatterns using the self-assembly of brush block copolymers (brush BCPs). Well-developed lamellar microdomains oriented perpendicular to the substrate are achieved, without modification of the underlying substrates, and structures with feature sizes greater than 200 nm are generated due to the reduced degree of chain entanglements of brush BCPs. A near-perfect linear scaling law was found for the period, L, as a function of backbone degree of polymerization (DP) for two series of brush BCPs. The exponent increases slightly from 0.99 to 1.03 as the side chain molecular weight increases from similar to 2.4 to similar to 4.5 kg/mol(-1) and saturated with further increase in the side chain molecular weight due to the entropic penalty associated with the packing of the side chains. Porous templates and scaffolds from brush BCP thin films are also obtained by selective etching of one component.

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