期刊
ACS NANO
卷 6, 期 9, 页码 8052-8059出版社
AMER CHEMICAL SOC
DOI: 10.1021/nn302641z
关键词
self-assembly; solvent vapor annealing; ps-pdms; block copolymer; toluene; heptane; self-consistent field theory
类别
资金
- Semiconductor Research Corporation
- FENA Center
- Tokyo Electron
- Taiwan Semiconductor Manufacturing Company
- National Science Foundation
Solvent vapor annealing of block copolymer thin films can produce a range of morphologies different from the equilibrium bulk morphology. By systematically varying the flow rate of two different solvent vapors (toluene and n-heptane) and an inert gas, phase maps showing the morphology versus vapor pressure of the solvents were constructed for 45 kg/mol polystyrene-block-polydimethylsiloxane diblock copolymer films of different thicknesses. The final morphology was correlated with the swelling of the block copolymer and homopolymer films and the solvent vapor annealing conditions. Self-consistent field theory is used to model the effects of solvent swelling. These results provide a framework for predicting the range of morphologies available under different solvent vapor conditions, which is important in lithographic applications where precise control of morphology and critical dimensions are essential.
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