General Route toward Patterning of Graphene Oxide by a Combination of Wettability Modulation and Spin-Coating

A general route was demonstrated to realize the patterning of reduced graphene oxide sheets (RGOs) on a variety of substrates by a combination of modulating the solution wettability of the substrates and spin-coating process. By virtue of usual surface treatment technique or application of mixed solvent, the GO solution wettability can be controlled precisely. The wettability modulation combined with spin-coating and reducing process brings on patterning of RGOs. This simple but effective, general, and low-cost approach holds great promise for numerous potential applications in organic electronics, flexible transparent conducting thin films, and flexible semi-transparent sensors.