4.8 Article

Placement Control of Nanomaterial Arrays on the Surface-Reconstructed Block Copolymer Thin Films

期刊

ACS NANO
卷 3, 期 12, 页码 3927-3934

出版社

AMER CHEMICAL SOC
DOI: 10.1021/nn900914q

关键词

block copolymer; thin films; self-assembly; nanomaterial arrays; dual nanomaterials patterning

资金

  1. Korea Science and Engineering Foundation (KOSEF)
  2. Acceleration Research [R17-2007-059-01000-0]
  3. NANO Systems Institute-National Core Research Center [R12003-032-02002-0]
  4. Ministry of Education, Science and Technology (MEST) of Korea
  5. MEST on graduate programs at Seoul National University
  6. Brain Korea 21 Frog ram and the World Class University (WCU) Program of Chemical Convergence for Energy and Environment [C2E2
  7. 400-2008-0230]
  8. Korean Ministry of Knowledge and Economy (MKE)
  9. Semiconductor Research Corporation
  10. National Science Foundation
  11. Nanoscale Science and Engineering Center (NSEC) at the University of Wisconsin [DMR-0425880]
  12. Division Of Materials Research
  13. Direct For Mathematical & Physical Scien [832760] Funding Source: National Science Foundation

向作者/读者索取更多资源

We present a control strategy for the facile placement of densely packed nanomaterial arrays (i.e., nanoparticles and nanorods) on surface reconstructed polystyrene-block-poly(methyl methacrylate) thin film patterns. The surface reconstruction of perpendicularly oriented block copolymer thin films, which were produced by a treatment with selective solvent vapors for both blocks, created the topographical nanopatterns with enough height contrast for nanoparticle deposition without the need for additional selective etching of a single block domain. The deposition method of nanomaterials was also optimized, and densely packed one- and two-dimensional nanomaterials arrays in the grooves of the block copolymer film patterns were fabricated efficiently. Then, we demonstrated that height contrast of the surface reconstructed block copolymer films could be reversed by electron beam irradiation resulting in nanomaterial arrays placed at the mesa phase of the nanopatterns. On the basis of this nanomaterial placement control strategy, dual nanomaterial arrays on a single block copolymer pattern were also realized.

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