期刊
ACS APPLIED MATERIALS & INTERFACES
卷 6, 期 16, 页码 13724-13729出版社
AMER CHEMICAL SOC
DOI: 10.1021/am5031787
关键词
p-type; oxide semiconductor; thin film transistor; tin monoxide; tin oxide; reactive sputtering
资金
- Ministry of Science and Technology [100-2622-E-002-004-CC2, 101-2221-E-002-158-MY3]
- Ministry of Education of Taiwan [103R7607-2]
In this work, we had investigated sputtering deposition of p-type SnO using the widely used and robust SnO2 target in a hydrogen-containing reducing atmosphere. The effects of the hydrogen-containing sputtering gas on structures, compositions, optical, and electrical properties of deposited SnOx films were studied. Results show that polycrystalline and SnO-dominant films could be readily obtained by carefully controlling the hydrogen gas ratio in the sputtering gas and the extent of reduction reaction. P-type conductivity was unambiguously observed for SnO-dominant films with traceable Sn components, exhibiting a p-type Hall mobility of up to similar to 3 cm(2) V-1 s(-1). P-type SnO thin-film transistors using such SnO-dominant films were also demonstrated.
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