期刊
ACS APPLIED MATERIALS & INTERFACES
卷 6, 期 15, 页码 11834-11838出版社
AMER CHEMICAL SOC
DOI: 10.1021/am5032105
关键词
atomic layer deposition; high-k dielectric; ozone; MoS2
资金
- SWAN (NIST) program
- LEAST
We present an Al2O3 dielectric layer on molybdenum disulfide (MoS2), deposited using atomic layer deposition (ALD) with ozone/trimethylaluminum (TMA) and water/TMA as precursors. The results of atomic force microscopy and low-energy ion scattering spectroscopy show that using TMA and ozone as precursors leads to the formation of uniform Al2O3 layers, in contrast to the incomplete coverage we observe when using TMA/H2O as precursors. Our Raman and X-ray photoelectron spectroscopy measurements indicate minimal variations in the MoS2 structure after ozone treatment at 200 degrees C, suggesting its excellent chemical resistance to ozone.
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