期刊
ACS APPLIED MATERIALS & INTERFACES
卷 6, 期 2, 页码 1018-1024出版社
AMER CHEMICAL SOC
DOI: 10.1021/am4045458
关键词
focused electron-beam-induced deposition; platinum; nanofabrication; electron-stimulated reactions
资金
- Oak Ridge National Laboratory by the Scientific User Facilities Division, Office of Basic Energy Sciences, U.S. Department of Energy
- Austrian Cooperative Research (ACR)
- Graz University of Technology in Austria
- University of Tennessee Chancellor's Fellowship program
- Semiconductor Research Corporation [SRC-2012-In-2310]
- EPSCoR
- Office Of The Director [1004083] Funding Source: National Science Foundation
Nanoscale metal deposits written directly by electron-beam-induced deposition, or EBID, are typically contaminated because of the incomplete removal of the original organometallic precursor. This has greatly limited the applicability of EBID materials synthesis, constraining the otherwise powerful direct-write synthesis paradigm. We demonstrate a low-temperature purification method in which platinum-carbon nanostructures deposited from MeCpP-tIVMe(3) are purified by the presence of oxygen gas during a post-electron exposure treatment. Deposit thickness, oxygen pressure, and oxygen temperature studies suggest that the dominant mechanism is the electron-stimulated reaction of oxygen molecules adsorbed at the defective deposit surface. Notably, pure platinum deposits with low resistivity and retain the original deposit fidelity were accomplished at an oxygen temperature of only 50 degrees C.
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