期刊
ACS APPLIED MATERIALS & INTERFACES
卷 5, 期 16, 页码 8067-8075出版社
AMER CHEMICAL SOC
DOI: 10.1021/am402153g
关键词
aqueous solution process; boron-doped peroxo-zirconium; thin-film transistor; hydrogen peroxide; indium oxide
资金
- National Research Foundation of Korea (NRF) [2012-0008721]
- government of Korea (MEST)
- LG Display
We developed a solution-processed indium oxide (In2O3) thin-film transistor (TFT) with a boron-doped peroxozirconium (ZrO2:B) dielectric on silicon as well as polyimide substrate at 200 degrees C, using water as the solvent for the In2O3 precursor. The formation of In2O3 and ZrO2:B films were intensively studied by thermogravimetric differential thermal analysis (TG-DTA), attenuated total reflectance Fourier transform infrared spectroscopy (ATR-FT IR), high-resolution X-ray diffraction (HR-XRD), and X-ray photoelectron spectroscopy (XPS). Boron was selected as a dopant to make a denser ZrO2 film. The ZrO2:B film effectively blocked the leakage current at 200 degrees C with high breakdown strength. To evaluate the ZrO2:B film as a gate dielectric, we fabricated In2O3 TFTs on the ZrO2:B dielectrics with silicon substrates and annealed the resulting samples at 200 and 250 degrees C. The resulting mobilities were 1.25 and 39.3 cm(2)/(V s), respectively. Finally, we realized a flexible In2O3 TFT with the ZrO2:B dielectric on a polyimide substrate at 200 degrees C, and it successfully operated a switching device with a mobility of 4.01 cm(2)/(V s). Our results suggest that aqueous solution-processed In2O3 TFTs on ZrO2:B dielectrics could potentially be used for low-cost, low-temperature, and high-performance flexible devices.
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