期刊
ACS APPLIED MATERIALS & INTERFACES
卷 5, 期 22, 页码 11836-11843出版社
AMER CHEMICAL SOC
DOI: 10.1021/am403503a
关键词
guanidine; antimicrobial; atmospheric pressure plasma; plasma enhanced-chemical vapor deposition; ultra high molecular weight polyethylene (UHMWPE); textiles
资金
- Postgraduate Research Program at the U.S. Army Research Laboratory
Antimicrobial coatings deposited onto ultra high molecular weight polyethylene (UHMWPE) films were investigated using an atmospheric pressure - plasma enhanced chemical vapor deposition (AP-PECVD) process. Varying concentrations of a guanidine-based liquid precursor, 1,1,3,3-tetramethylguanidine, were used, and different deposition conditions were studied. Attenuated total reflectance - Fourier Transform Infrared (ATR-FTIR) spectroscopy and X-ray Photoelectron Spectroscopy (XPS) were used to study the chemical structure and elemental composition of the coatings. Conformity, morphology, and coating thickness were assessed through SEM and AFM. Optimal AP-PECVD parameters were chosen and applied to deposit guanidine coatings onto woven fabrics. The coatings exhibited high antimicrobial activity against Escherichia coli (E. coli) and Staphylococcus aureus (S. aureus) based on a modified-AATCC 100 test standard, where 2-5 log reductions were achieved.
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