4.8 Article

Surface Science and Electrochemical Analysis of Nickel Foams

期刊

ACS APPLIED MATERIALS & INTERFACES
卷 4, 期 6, 页码 3012-3021

出版社

AMER CHEMICAL SOC
DOI: 10.1021/am300380m

关键词

nickel electrode; nickel foam; nickel hydroxide; nickel oxide; chemical etching; real surface area; electrochemically active surface area; X-ray photoelectron spectroscopy; cyclic-voltammetry

资金

  1. NSERC of Canada
  2. Kuwait University

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Open-pore nickel (Ni) foams are characterized using surface science and electrochemical techniques. A scanning electron microscopy analysis reveals interconnected Ni struts that generate small and large pores of ca. 50 and 500 pm in size, respectively. An X-ray photoelectron spectroscopy (XPS) analysis of the surface-chemical composition of the Ni foams shows that there are oxidized and metallic sections within their surfaces despite being prepared by sintering in an oxidizing atmosphere at a high temperature and being stored in moist air. The ratio of the areas of oxidized and metallic sections is evaluated using XPS data. Chemical etching of the Ni foams results in removal of the native surface oxide/hydroxide without altering the three-dimensional structure; it also increases the roughness (R) of the surfaces of Ni struts giving rise to an increase in the electrochemically active surface area (A(ecsa)) Thermal treatment of Ni foams in an H-2(g) atmosphere at 500 C reduces the native surface oxide/hydroxide but does not increase R or A(ecsa). Electrochemical behavior of the Ni foams is examined in 0.5 M aqueous KOH solution using cyclicvoltammetry (CV) and electrochemical impedance spectroscopy (EIS). As-received, chemically etched, thermally reduced and electro-oxidized Ni foams generate distinct CV profiles; their features are assigned to oxidized and metallic surface states. The observations made on the basis of XPS measurements are corroborated by the results of CV analyses. The application of CV and XPS or EIS allows in situ determination of Ae, and the specific surface area (A(s)) of the chemically etched and thermally reduced Ni foams. The values of A(s) determined on the basis of joint CV and XPS measurements are 227 +/- 74 and 149 +/- 48 cm(2) g(-1) the etched and reduced Ni foams, respectively. The values of A, determined on the basis of CV, XPS and EIS measurements are 241 +/- 80 and 160 +/- 23 cm g(-1) the etched and reduced Ni foams, respectively

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