4.7 Article

Dual Loops Meshing: Quality Quad Layouts on Manifolds

期刊

ACM TRANSACTIONS ON GRAPHICS
卷 31, 期 4, 页码 -

出版社

ASSOC COMPUTING MACHINERY
DOI: 10.1145/2185520.2185606

关键词

quad mesh; base complex; edge flow; simplification; segmentation; parameterization

资金

  1. DFG Cluster of Excellence UMIC [DFG EXC 89]

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We present a theoretical framework and practical method for the automatic construction of simple, all-quadrilateral patch layouts on manifold surfaces. The resulting layouts are coarse, surface-embedded cell complexes well adapted to the geometric structure, hence they are ideally suited as domains and base complexes for surface parameterization, spline fitting, or subdivision surfaces and can be used to generate quad meshes with a high-level patch structure that are advantageous in many application scenarios. Our approach is based on the careful construction of the layout graph's combinatorial dual. In contrast to the primal this dual perspective provides direct control over the globally interdependent structural constraints inherent to quad layouts. The dual layout is built from curvature-guided, crossing loops on the surface. A novel method to construct these efficiently in a geometry- and structure-aware manner constitutes the core of our approach.

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